Global CD uniformity measurement based on 64 points on a test mask.... | Download Scientific Diagram
Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design | Semantic Scholar
Critical Dimension Control and its Implications in IC Performance - ppt download
Process Setup and Optimization • LithExx-Systems
CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram
A study of AA CD uniformity loading optimization at 28nm node | Semantic Scholar
Local y CD uniformity of 480 nm features-1.0 mm array (left); local... | Download Scientific Diagram
a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram
Contact local CD uniformity optimization through etch shrink
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram
Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram
Requirement for mask CD uniformity and mask induced overlay error. | Download Scientific Diagram
Comprehensive CD Uniformity Control in Lithography and Etch Process - ppt download
CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Global AEI CD uniformity comparison between n&k R-T Scatterometer and... | Download Scientific Diagram
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
Process Setup and Optimization • LithExx-Systems
Global ASI CD uniformity comparison between n&k R-T Scatterometer and... | Download Scientific Diagram
Intrawafer CD uniformity trend for Etch GATE in 40nm > 30% CD... | Download Scientific Diagram
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect
Measured CD Uniformity for Conventional Method and New Method.... | Download Scientific Diagram
The Global Variation of Photoresist Topography and CD Uniformity due to Local High Step
Controlling Uniformity At The Edge
In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modelin
